Clean Room Facility

A class 100 clean room is available for all micro- and nano-optics fabrication requirements. A portion of the facility will be class 1000 for experimental work with less stringent requirements. Total clean room space is approximately 3,000 sq. ft. The clean room includes necessary facilities, such as advanced lithography and processing, for the fabrication of complex optoelectronic devices and integrated circuits, including a Molecular Imprint Inc. Imprio 100 nanoimprint tool. High-purity water is provided by a recirculating deionized system. Purge and process gases are plumbed throughout the facility. NanoFabrication Facility Safety and Standard Operating Procedures Manual.

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